High-Purity hexachlorodisilane
Manufactured using our unique technologies, HCD occupies the top market share globally due to its high quality and stability.
- Product Name
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HCD
Features
High-purity hexachlorodisilane (HCD) has high reactivity and storage stability and can be used as a silicon precursor for low-temperature deposition. Suited for SiO2 and SiNx deposition for semiconductors, this material is essential for forming microfabricated wiring on the latest generation of semiconductors.
Usage
High-purity hexachlorodisilane (HCD) can be used as a silicon precursor for high-precision SiOx or SiNx depositions, or SiOxNy depositions through reaction with oxygen- or nitrogen-based substances in various CVD and ALD processes.
Specifications
- Quality
High-purity product with a metal base purity of > 99.9999%. - Container
The product is supplied in various metal cylinders.
Inquiries
- Department in charge
- Performance Electronics Material Department
- Phone number
- +81-3-3597-7403
*9:00 am - 5:00 pm (except weekends and holidays)
