Home > News Release > News prior to 2005 > The Special Gases Business and Plans to Expand Production of High-Purity Chlorine
July 1997
The Special Gases Business and Plans to Expand Production of High-Purity Chlorine
As part of its specialized operations in the field of industrial gases, Toagaosei is involved in the production of special gases for the electronics industry. These include liquid disilane gas, high-purity chlorine, hydrochloric acid anhydride, TRIES and F-TRIES. Liquid disilane gas enables high-speed film deposition and low-temperature processing in the deposition of silicon thin films used in semiconductors and other devices. It is used in this field as a raw material gas in such semiconductor processes as the production of oxide films, nitride films, polysilicon films and epitaxial growth, and its superior properties have led to steady growth in sales to electronic equipment manufacturers in Japan and overseas.
Demand for high-purity chlorine used in the manufacture of semiconductors and optical fibers is growing and we are proceeding with plans to expand production to meet this demand. Furthermore, to expand our special gases business, we are engaged in the development of new special gases and applications for them. Our efforts in this regard are directed not only at the Japanese market, but also overseas markets.